WAMPLER, Thomas: search on Z-Library

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1

Learning From the Past, Altering the Future: A Tentative Theory of the Effect of Past Relationships on Couples Who Remarry

ANDREW BRIMHALL, KAREN WAMPLER, THOMAS KIMBALL

Journal:

Year:

2008

Language:

english

File:

PDF, 161 KB

english, 2008

2

Observing Attachment Behavior in Couples: The Adult Attachment Behavior Q-Set (AABQ)

Karen S. Wampler, Bruce Riggs, Thomas G. Kimball

Journal:

Year:

2004

Language:

english

File:

PDF, 170 KB

english, 2004

3

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node

Van Den Broeke, Douglas J., Tanabe, Hiroyoshi, Laidig, Thomas L., Chen, J. Fung, Wampler, Kurt E., Hsu, Stephen D., Shi, Xuelong, Socha, Robert J., Dusa, Mircea V., Corcoran, Noel P.

Year:

2004

Language:

english

File:

PDF, 962 KB

english, 2004

4

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - 65-nm full-chip implementation using double dipole lithography

Hsu, Stephen D., Chen, J. Fung, Cororan, Noel, Knose, William T., Van Den Broeke, Douglas J., Laidig, Thomas L., Wampler, Kurt E., Shi, Xuelong, Hsu, Michael, Eurlings, Mark, Finders, Jo, Chiou, Tsann

Year:

2003

Language:

english

File:

PDF, 1.41 MB

english, 2003

5

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL

Hsu, Michael, Tanabe, Hiroyoshi, Laidig, Thomas L., Wampler, Kurt E., Hsu, Stephen D., Shi, Xuelong, Chen, J. Fung, Van Den Broeke, Douglas J., Hsieh, Frank

Year:

2004

Language:

english

File:

PDF, 766 KB

english, 2004

6

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Chen, J. Fung, Van Den Broeke, Douglas J., Hsu, Michael, Laidig, Thomas L., Wampler, Kurt E., Shi, Xuelong, Hsu, Stephen, Shafer, Ted, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 563 KB

english, 2002

7

Young adult offspring and their families of origin: Cohesion, adaptability, and addiction

Richard Wampler, Judith Fischer, Madoc Thomas, Kevin Lyness

Journal:

Journal of Substance Abuse

Year:

1993

Language:

english

File:

PDF, 368 KB

english, 1993

8

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Contact hole reticle optimization by using interference mapping lithography (IML)

Socha, Robert J., Tanabe, Hiroyoshi, Van Den Broeke, Douglas J., Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel P., Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong, Conley, Willard

Year:

2004

Language:

english

File:

PDF, 1.22 MB

english, 2004

9

The Adult Attachment Interview and Observed Couple Interaction: Implications for an Intergenerational Perspective on Couple Therapy

KAREN S. WAMPLER, LIN SHI, BRIANA S. NELSON, THOMAS G. KIMBALL

Journal:

Year:

2003

Language:

english

File:

PDF, 1.38 MB

english, 2003

10

Recent changes in automotive paint formulation using pyrolysis-gas chromatography/mass spectrometry for identification

Thomas P. Wampler, Gregory A. Bishea, William J. Simonsick

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

1997

Language:

english

File:

PDF, 585 KB

english, 1997

11

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Imaging techniques to support low k1 optical lithography

Conley, W., Nelson-Thomas, C., Brankner, K., Wei Wu,, Strozewski, K., Thompson, M., Lucas, K., Garza, C., Chi-Min Yuan,, Carter, R., Montgomery, P., Socha, R., Yu, L., van den Broke, D., Wampler, K.

Year:

2002

Language:

english

File:

PDF, 48 KB

english, 2002

12

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Binary halftone chromeless PSM technology for λ/4;optical lithography

Chen, J. Fung, Petersen, John S., Socha, Robert J., Laidig, Thomas L., Wampler, Kurt E., Nakagawa, Kent H., Hughes, Greg P., MacDonald, Susan S., Ng, Waiman, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 4.12 MB

english, 2001

13

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers

Lu, Hao H., Grenon, Brian J., Abboud, Frank E., Hwang, Raymond, Lee, Vincent, Q, Willy, Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F.

Year:

1998

Language:

english

File:

PDF, 3.15 MB

english, 1998

14

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - CD error sensitivity to "sub-killer" defects at k 1 near 0.4: II

Nakagawa, Kent H., Abboud, Frank E., Grenon, Brian J., Chen, J. Fung, Socha, Robert J., Dusa, Mircea V., Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Van Den Broeke, Douglas J.

Year:

1999

Language:

english

File:

PDF, 1.25 MB

english, 1999

15

Photocatalytically Generated Pt∕C–TiO[sub 2] Electrocatalysts with Enhanced Catalyst Dispersion for Improved Membrane Durability in Polymer Electrolyte Fuel Cells

de Tacconi, Norma R., Chenthamarakshan, C. Ramannair, Rajeshwar, Krishnan, Lin, Wen-Yuan, Carlson, Thomas F., Nikiel, Leszek, Wampler, Wesley A., Sambandam, Satheesh, Ramani, Vijay

Journal:

Journal of The Electrochemical Society

Year:

2008

Language:

english

File:

PDF, 659 KB

english, 2008

16

Effects of slow heating rates on products of polyethylene pyrolysis

Wampler, Thomas P., Levy, Eugene J.

Journal:

The Analyst (Royal Society of Chemistry)

Year:

1986

Language:

english

File:

PDF, 346 KB

english, 1986

17

Juvenile Idiopathic Arthritis in Olmsted County, Minnesota, 1960-2013

Krause, Megan L., Crowson, Cynthia S., Michet, C. John, Mason, Thomas, Muskardin, Theresa Wampler, Matteson, Eric L.

Journal:

Arthritis & Rheumatology

Year:

2016

Language:

english

File:

PDF, 258 KB

english, 2016

18

SPIE Proceedings [SPIE 33rd Annual Techincal Symposium - San Diego (Monday 7 August 1989)] New Methods in Microscopy and Low Light Imaging - A Video Rate Confocal Laser Beam Scanning Light Microscope Using An Image Dissector

Goldstein, Seth R., Hubin, Thomas, Rosenthal, Scott, Washburn, Clayton, Wampler, John E.

Year:

1989

Language:

english

File:

PDF, 10.11 MB

english, 1989

19

Formation of Pyrazines by Chitin Pyrolysis

DIETRICH KNORR, THOMAS P. WAMPLER, RITA A. TEUTONICO

Journal:

Journal of Food Science

Year:

1985

Language:

english

File:

PDF, 261 KB

english, 1985

20

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Eigen-decomposition-based models for model OPC

Shi, Xuelong, Tanabe, Hiroyoshi, Laidig, Thomas L., Chen, J. Fung, Van Den Broeke, Douglas J., Hsu, Stephen D., Hsu, Michael, Wampler, Kurt E., Hollerbach, Uwe

Year:

2004

Language:

english

File:

PDF, 187 KB

english, 2004

21

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Application of CPL reticle technology for the 65- and 50-nm node

Conley, Will, Van Den Broeke, Douglas J., Socha, Robert J., Wu, Wei, Litt, Lloyd C., Lucas, Kevin, Nelson-Thomas, Carla M., Roman, Bernard J., Chen, J. Fung, Wampler, Kurt E., Laidig, Thomas L., Hsu,

Year:

2003

Language:

english

File:

PDF, 500 KB

english, 2003

22

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Manufacturing an advanced process characterization reticle incorporating halftone biasing

Nakagawa, Kent H., Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Behringer, Uwe F. W.

Year:

1999

Language:

english

File:

PDF, 1.15 MB

english, 1999

23

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Contact hole reticle optimization by using interference mapping lithography (IML)

Socha, Robert J., Van Den Broeke, Douglas J., Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel, Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong, Conley, Will, Smith, Bruce W.

Year:

2004

Language:

english

File:

PDF, 1018 KB

english, 2004

24

Introduction to pyrolysis–capillary gas chromatography

Thomas P Wampler

Journal:

Journal of Chromatography A

Year:

1999

Language:

english

File:

PDF, 357 KB

english, 1999

25

Gas Chromatography || Pyrolysis Gas Chromatography

Wampler, Thomas P.

Year:

2012

Language:

english

File:

PDF, 910 KB

english, 2012

26

Work-Centered Design and Evaluation of a C2 Visualization Aid

Roth, E., Stilson, M., Scott, R., Whitaker, R., Kazmierczak, T., Thomas-Meyers, G., Wampler, J.

Journal:

Proceedings of the Human Factors and Ergonomics Society Annual Meeting

Year:

2006

Language:

english

File:

PDF, 519 KB

english, 2006

27

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)

Van Den Broeke, Douglas J., Laidig, Thomas L., Wampler, Kurt E., Hsu, Stephen, Shi, Xuelong, Hsu, Michael, Burchard, Paul, Chen, J. Fung, Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 465 KB

english, 2002

28

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Practical technology path to sub-0.10-μm process generations via enhanced optical lithography

Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Nakagawa, Kent H., Liebchen, Armin, Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 2.32 MB

english, 1999

29

SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems

Nakagawa, Kent H., Chen, J. Fung, Socha, Robert J., Laidig, Thomas L., Wampler, Kurt E., Van Den Broeke, Douglas J., Dusa, Mircea V., Caldwell, Roger F., Morimoto, Hiroaki

Year:

1999

Language:

english

File:

PDF, 1.70 MB

english, 1999

30

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Petersen, John S., Conley, Will, Roman, Bernard J., Litt, Lloyd C., Lucas, Kevin, Wu, Wei, Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Gerold, David J., Socha, Robe

Year:

2002

Language:

english

File:

PDF, 554 KB

english, 2002

31

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Investigation of model OPC optimization based on CD uniformity yield

Roy, Sabita, Chen, J. Fung, Liebchen, Armin, Laidig, Thomas L., Wampler, Kurt E., Hollerbach, Uwe, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 839 KB

english, 2003

32

Distinct Single Cell Gene Expression in Peripheral Blood Monocytes Correlates With Tumor Necrosis Factor Inhibitor Treatment Response Groups Defined by Type I Interferon in Rheumatoid Arthritis

Wampler Muskardin, Theresa L., Fan, Wei, Jin, Zhongbo, Jensen, Mark A., Dorschner, Jessica M., Ghodke-Puranik, Yogita, Dicke, Betty, Vsetecka, Danielle, Wright, Kerry, Mason, Thomas, Persellin, Scott,

Journal:

Frontiers in Immunology

Year:

2020

File:

PDF, 1.28 MB

2020

33

Determination of polymer additives using analytical pyrolysis

Karen D. Jansson, Charles P. Zawodny, Thomas P. Wampler

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

2007

Language:

english

File:

PDF, 495 KB

english, 2007

34

Platinum-carbon black-titanium dioxide nanocomposite electrocatalysts for fuel cell applications

Satheesh Sambandam, Vinodh Valluri, Wilaiwan Chanmanee, Norma R. de Tacconi, Wesley A. Wampler, Wen-Yuan Lin, Thomas F. Carlson, Vijay Ramani, Krishnan Rajeshwar

Journal:

Journal of Chemical Sciences

Year:

2009

Language:

english

File:

PDF, 568 KB

english, 2009

35

Treatment of patients with juvenile idiopathic arthritis (JIA) in a population-based cohort

Zamora-Legoff, Jorge A., Krause, Megan L., Crowson, Cynthia S., Muskardin, Theresa Wampler, Mason, Thomas, Matteson, Eric L.

Journal:

Clinical Rheumatology

Year:

2016

Language:

english

File:

PDF, 279 KB

english, 2016

36

The effect of carbon-black filling on the pyrolysis behavior of natural and synthetic rubbers

Margaret J. Matheson, Thomas P. Wampler, William J. Simonsick Jr.

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

1994

Language:

english

File:

PDF, 448 KB

english, 1994

37

K-Ar Age Constraints on the Origin of Micaceous Minerals in Savannah River Site Soils, South Carolina, USA

Naumann, Thomas E., Elliott, W. Crawford, Wampler, J. M.

Journal:

Clays and Clay Minerals

Year:

2012

Language:

english

File:

PDF, 505 KB

english, 2012

38

Experimental validation of a model for particle recycling and tungsten erosion during ELMs in the DIII-D divertor

Abrams, T., Unterberg, E.A., McLean, A.G., Rudakov, D.L., Wampler, W.R., Knolker, M., Lasnier, C., Leonard, A.W., Stangeby, P.C., Thomas, D.M., Wang, H.Q.

Journal:

Nuclear Materials and Energy

Year:

2018

Language:

english

File:

PDF, 1.30 MB

english, 2018

39

Investigation of monomer ratios in random and block copolymers of ethylene and propylene using pyrolysis–gas chromatography/mass spectrometry

Thomas Wampler, Charles Zawodny, Leticia Mancini, Justin Wampler

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

2003

Language:

english

File:

PDF, 294 KB

english, 2003

40

Ferromagnetism in partially oxidized CuCl

Saerbeck, Thomas, Pereiro, Juan, Wampler, James, Stanley, Jacob, Wingert, James, Shpyrko, Oleg G., Schuller, Ivan K.

Journal:

Journal of Magnetism and Magnetic Materials

Year:

2013

Language:

english

File:

PDF, 1.61 MB

english, 2013

41

SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Petersen, John S., Conley, Will, Roman, Bernard J., Litt, Lloyd C., Lucas, Kevin, Wu, Wei, Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Gerold, David J., Maslow, Mar

Year:

2002

Language:

english

File:

PDF, 517 KB

english, 2002

42

SPIE Proceedings [SPIE SPIE Astronomical Telescopes + Instrumentation - San Diego, California, USA (Sunday 27 June 2010)] Ground-based and Airborne Instrumentation for Astronomy III - The ATST visible broadband imager: a case study for real-time image reconstruction and optimal data handling

Wöger, Friedrich, McLean, Ian S., Ramsay, Suzanne K., Uitenbroek, Han, Tritschler, Alexandra, Takami, Hideki, McBride, William, Elmore, David, Rimmele, Thomas, Cowan, Bruce, Wampler, Steve, Goodrich,

Year:

2010

Language:

english

File:

PDF, 183 KB

english, 2010

43

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Socha, Robert J., Shi, Xuelong, Holman, Ken C., Dusa, Mircea V., Conley, Will, Petersen, John S., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Chu, M. C., Su, Chung Jen, Hun

Year:

1999

Language:

english

File:

PDF, 4.29 MB

english, 1999

44

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Near-0.3 k 1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Van Den Broeke, Douglas J., Kimmel, Kurt R., Staud, Wolfgang, Socha, Robert, Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel, Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong

Year:

2003

Language:

english

File:

PDF, 1011 KB

english, 2003

45

Synthesis of potential dual-acting radiation sensitizer antineoplastic agents: 2,2-dimethylphosphoraziridines containing 2-nitroimidazoles or other electron-affinic moieties

Perlman, Michael E., Dunn, Joseph A., Piscitelli, Thomas A., Earle, Julie, Rose, William C., Wampler, Galen L., MacDiarmid, Joan E., Bardos, Thomas J.

Journal:

Journal of Medicinal Chemistry

Year:

1991

Language:

english

File:

PDF, 1.02 MB

english, 1991

46

Using Work-Centered Specifications to Integrate Cognitive Requirements into Software Development

Wampler, J., Roth, E., Whitaker, R., Conrad, K., Stilson, M., Thomas-Meyers, G., Scott, R.

Journal:

Proceedings of the Human Factors and Ergonomics Society Annual Meeting

Year:

2006

Language:

english

File:

PDF, 388 KB

english, 2006

47

Immunohistochemical Localization of Endothelial and Inducible Nitric Oxide Synthase within Neurons of Cattle with Rabies

SHIN, Taekyun, WEINSTOCK, Daniel, CASTRO, Marlene D., HAMIR, Amir N., WAMPLER, Thomas, WALTER, Mark, KIM, Hyun Young, ACLAND, Helen

Journal:

Journal of Veterinary Medical Science

Year:

2004

Language:

english

File:

PDF, 64 KB

english, 2004

48

Measurement and modeling of aluminum sputtering and ionization in the DIII-D divertor including magnetic pre-sheath effects

Chrobak, C.P., Stangeby, P.C., Hollmann, E., Rudakov, D.L., Abrams, T., Ding, R., Elder, J.D., Guterl, J., Hinson, E., Guo, H.Y., Thomas, D.M., Skinner, C.H., McLean, A.G., Wampler, W.R., Buchenauer,

Journal:

Year:

2018

Language:

english

File:

PDF, 1.84 MB

english, 2018

49

SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Resolution enhancement with high-transmission attenuating phase-shift masks

Socha, Robert J., Conley, Will, Shi, Xuelong, Dusa, Mircea V., Petersen, John S., Chen, J. Fung, Wampler, Kurt E., Laidig, Thomas L., Caldwell, Roger F., Morimoto, Hiroaki

Year:

1999

Language:

english

File:

PDF, 3.96 MB

english, 1999

50

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - CD error sensitivity to "sub-killer" defects at k1 near 0.4

Chen, J. Fung, Singh, Bhanwar, Diachun, Nathan A., Nakagawa, Kent H., Socha, Robert J., Dusa, Mircea V., Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Van Den Broeke, Douglas J.

Year:

1999

Language:

english

File:

PDF, 2.41 MB

english, 1999

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